The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Feb. 04, 2011
Vadim Yevgenyevich Banine, Helmond, NL;
Levinus Pieter Bakker, Helmond, NL;
Ralph Kurt, Eindhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Peter Cornelis Zalm, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Levinus Pieter Bakker, Helmond, NL;
Ralph Kurt, Eindhoven, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Peter Cornelis Zalm, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.