The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2012

Filed:

Jul. 31, 2007
Applicants:

Shmuel Mangan, Rehovot, IL;

Boris Goldberg, Ashdod, IL;

Ishai Schwarzband, Or-Yehuda, IL;

On Haran, Kfar-Saba, IL;

Michael Ben-yishay, Natanya, IL;

Amir Sagiv, Beit-Zayit, IL;

Chaim Braude, Rehovot, IL;

Inventors:

Shmuel Mangan, Rehovot, IL;

Boris Goldberg, Ashdod, IL;

Ishai Schwarzband, Or-Yehuda, IL;

On Haran, Kfar-Saba, IL;

Michael Ben-Yishay, Natanya, IL;

Amir Sagiv, Beit-Zayit, IL;

Chaim Braude, Rehovot, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G01N 21/21 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system, method and computer readable medium for reticle evaluation, the method includes: (i) obtaining, during an imaging process, multiple images of the reticle under different polarization and optionally interferometric conditions; and (ii) generating an output aerial image in response to (i) the multiple images and (ii) differences between the imaging process and an exposure process; wherein during the exposure process an image of the reticle is projected onto a wafer.


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