The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2012

Filed:

Jan. 30, 2009
Applicants:

Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;

Manfred Gawein Tenner, Eindhoven, NL;

Patrick Warnaar, Tilburg, NL;

Marc Van Kemenade, Eindhoven, NL;

Inventors:

Franciscus Godefridus Casper Bijnen, Valkenswaard, NL;

Manfred Gawein Tenner, Eindhoven, NL;

Patrick Warnaar, Tilburg, NL;

Marc Van Kemenade, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

An alignment mark comprising a periodic structure formed by mark lines is described. In an embodiment, the alignment mark is formed in a scribe lane of a substrate, the scribe lane extending in a scribe lane direction. The alignment mark includes: a first area including a first periodic structure formed by first mark lines extending in a first direction, the first direction being at a first angle α with respect to the scribe lane direction: 0°<α<90° and a second area comprising second periodic structure formed by second mark lines extending in a second direction, the second direction being at a second angle β with respect to the scribe lane direction: −90°≦β<0°.


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