The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
May. 04, 2009
Jun Hatakeyama, Jyoetsu, JP;
Tsutomu Ogihara, Jyoetsu, JP;
Mutsuo Nakashima, Jyoetsu, JP;
Kazuhiro Katayama, Jyoetsu, JP;
Jun Hatakeyama, Jyoetsu, JP;
Tsutomu Ogihara, Jyoetsu, JP;
Mutsuo Nakashima, Jyoetsu, JP;
Kazuhiro Katayama, Jyoetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The present invention provides a patterning process, in which a resistance with regard to an organic solvent used for a composition for formation of a reverse film is rendered to a positive pattern to the degree of necessity and yet solubility into an alkaline etching liquid is secured, thereby enabling to finally obtain a negative image by a positive-negative reversal by performing a wet etching using an alkaline etching liquid. A resist patterning process of the present invention using a positive-negative reversal comprises at least a step of forming a resist film by applying a positive resist composition; a step of obtaining a positive pattern by exposing and developing the resist film; a step of crosslinking the positive resist pattern thus obtained; a step of forming a reverse film; and a step of reversing the positive pattern to a negative pattern by dissolving into an alkaline wet-etching liquid for removal.