The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Jan. 15, 2010
Hiromitsu Mashita, Kanagawa, JP;
Katsumi Iyanagi, Kanagawa, JP;
Takafumi Taguchi, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Hidefumi Mukai, Kanagawa, JP;
Taiga Uno, Kanagawa, JP;
Takashi Nakazawa, Kanagawa, JP;
Hiromitsu Mashita, Kanagawa, JP;
Katsumi Iyanagi, Kanagawa, JP;
Takafumi Taguchi, Kanagawa, JP;
Toshiya Kotani, Tokyo, JP;
Hidefumi Mukai, Kanagawa, JP;
Taiga Uno, Kanagawa, JP;
Takashi Nakazawa, Kanagawa, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern data creating method comprising: referring to a first correspondence relation between an amount of dimension variation between a first pattern formed on a substrate and a second pattern formed by processing the substrate using the first pattern and either one of a pattern total surface area and a pattern boundary length of the first pattern; and creating pattern data for forming the first pattern.