The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Sep. 30, 2008
Heine Melle Mulder, Veldhoven, NL;
Joost Cyrillus Lambert Hageman, Eindhoven, NL;
Roland Johannes Wilhelmus Stas, 's-Hertogenbosch, NL;
Heine Melle Mulder, Veldhoven, NL;
Joost Cyrillus Lambert Hageman, Eindhoven, NL;
Roland Johannes Wilhelmus Stas, 's-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illumination system configured to condition a beam of radiation, a support structure configured to hold a reticle, a substrate table configured to hold a substrate, and a projection system configured to project a beam onto the substrate table. The numerical aperture of the illumination system is larger than the numerical aperture of the projection system. The apparatus also includes a radiation redirection device configured to re-direct σ>1 components of the beam of radiation to within the numerical aperture of the projection system.