The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Jan. 09, 2009
Kazuya Goto, Tokyo, JP;
Kazuya Goto, Tokyo, JP;
JEOL Ltd., Tokyo, JP;
Abstract
A method of calibrating the beam position in a charged-particle beam system starts with finding a focus deviation on the material surface for each point within a deflection field. A focus correction voltage Vnecessary to cancel out the focus deviation is determined. A beam position deviation fper unit focus correction voltage is found. The deflection voltage is corrected so as to cancel out the product f·V. The deflection voltage is corrected so as to cancel out the sum of the product f·Vand the measured deflection field distortion while correcting the focus based on the voltage V.
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