The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
Jun. 26, 2008
Yoshimi Isono, Kawagoe, JP;
Jonathan Joachim Jodry, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiro Yamanaka, Kokubunji, JP;
Yoshimi Isono, Kawagoe, JP;
Jonathan Joachim Jodry, Kawagoe, JP;
Satoru Narizuka, Saitama, JP;
Kazuhiro Yamanaka, Kokubunji, JP;
Central Glass Company, Limited, Ube-shi, JP;
Abstract
Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein Rrepresents a polymerizable double-bond containing group, Rrepresents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein Rand W are defined as above, each of R, Rand Rindependently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R, Rand Rmay be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.