The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2012
Filed:
May. 20, 2005
Keith A. Miller, Sunnyvale, CA (US);
Genhua Xu, Shanghai, CN;
Shengde Zhong, Shanghai, CN;
Mahendra Bhagwat Lokhande, Santa Clara, CA (US);
Keith A. Miller, Sunnyvale, CA (US);
Genhua Xu, Shanghai, CN;
Shengde Zhong, Shanghai, CN;
Mahendra Bhagwat Lokhande, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length Land a jacket around the conductor receptacle, the jacket having a second length L. The length Lis larger than the length L. A conductor cup is provided about the standoff having the terminal.