The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2012
Filed:
Oct. 17, 2007
Masahiko Tomita, Nirasaki, JP;
Kota Umezawa, Nirasaki, JP;
Ryou Son, Nirasaki, JP;
Toshiharu Nishimura, Nirasaki, JP;
Masahiko Tomita, Nirasaki, JP;
Kota Umezawa, Nirasaki, JP;
Ryou Son, Nirasaki, JP;
Toshiharu Nishimura, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method for using a semiconductor processing apparatus includes supplying an oxidizing gas and a reducing gas into a process container of the processing apparatus accommodating no product target substrate therein; causing the oxidizing gas and the reducing gas to react with each other within a first atmosphere that activates the oxidizing gas and the reducing gas inside the process container, thereby generating radicals; and removing a contaminant from an inner surface of the process container by use of the radicals.