The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2012
Filed:
Dec. 18, 2008
Toshihiko Nakata, Hiratsuka, JP;
Masahiro Watanabe, Yokohama, JP;
Takashi Inoue, Yokohama, JP;
Kishio Hidaka, Hitachiota, JP;
Makoto Okai, Tokorozawa, JP;
Toshiaki Morita, Hitachi, JP;
Motoyuki Hirooka, Kumagaya, JP;
Toshihiko Nakata, Hiratsuka, JP;
Masahiro Watanabe, Yokohama, JP;
Takashi Inoue, Yokohama, JP;
Kishio Hidaka, Hitachiota, JP;
Makoto Okai, Tokorozawa, JP;
Toshiaki Morita, Hitachi, JP;
Motoyuki Hirooka, Kumagaya, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
Optical information and topographic information of the surface of a sample are measured at a nanometer-order resolution and with high reproducibility without damaging a probe and the sample by combining a nanometer-order cylindrical structure with a nanometer-order microstructure to form a plasmon intensifying near-field probe having a nanometer-order optical resolution and by repeating approach/retreat of the probe to/from each measurement point on the sample at a low contact force.