The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Jun. 02, 2010
Amit Kumar, Williston, VT (US);
Howard Smith Landis, Underhill, VT (US);
Jeanne-tania Sucharitaves, Williston, VT (US);
Amit Kumar, Williston, VT (US);
Howard Smith Landis, Underhill, VT (US);
Jeanne-Tania Sucharitaves, Williston, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming a mask. The method includes providing design information of a design layer. The design layer includes M original design features and N original dummy features. The method further includes (i) creating a cluster of P representative dummy features, P being a positive integer less than N, (ii) performing OPC for the cluster of the P representative dummy features but not for the N original dummy features, resulting in P OPC-applied representative dummy features, and (iii) forming the mask including N mask dummy features. The N mask dummy features are identical. Each mask dummy feature of the N mask dummy features of the mask has an area which is a function of at least an area of an OPC-applied representative dummy feature of the P OPC-applied representative dummy features. The N mask dummy features have the same relative positions as the N original dummy features.