The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Jan. 08, 2008
Applicants:
Daisuke Shimizu, Tokyo, JP;
Ken Maruyama, Tokyo, JP;
Toshiyuki Kai, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Inventors:
Daisuke Shimizu, Tokyo, JP;
Ken Maruyama, Tokyo, JP;
Toshiyuki Kai, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); C07C 39/08 (2006.01); C07C 39/17 (2006.01); C07C 65/01 (2006.01);
U.S. Cl.
CPC ...
Abstract
A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.