The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Jun. 18, 2009
Shinya Nishimoto, Amagasaki, JP;
Shinya Nishimoto, Amagasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
A microwave plasma processing apparatus performs plasma processing on a substrate by exciting a gas by electric field energy of microwaves emitted from a radial line slot antenna (RLSA). The microwave plasma processing apparatus includes: a processing container in which plasma processing is performed; a microwave source outputting microwaves; a rectangular waveguide transmitting the microwaves outputted from the microwave source; a coaxial converter converting a mode of the microwaves transmitted to the rectangular waveguide; a coaxial waveguide including an inner conductor slidably and electrically connected to the coaxial converter by a first contact member; the first contact member fixed to the coaxial converter and slidably contacting the inner conductor; and a first spring member absorbing displacement, which is caused by thermal expansion, of the RLSA and a member disposed above the RLSA.