The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2012
Filed:
May. 20, 2008
Eashwer Kollata, Sunnyvale, CA (US);
Shou-sung Chang, Stanford, CA (US);
Zhenhua Zhang, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Sen-hou Ko, Sunnyvale, CA (US);
Antoine P. Manens, Sunnyvale, CA (US);
Gary C. Ettinger, Cupertino, CA (US);
Ricardo Martinez, Manteca, CA (US);
Eashwer Kollata, Sunnyvale, CA (US);
Shou-Sung Chang, Stanford, CA (US);
Zhenhua Zhang, San Jose, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Sen-Hou Ko, Sunnyvale, CA (US);
Antoine P. Manens, Sunnyvale, CA (US);
Gary C. Ettinger, Cupertino, CA (US);
Ricardo Martinez, Manteca, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatus and methods are provided to polish an edge of a substrate. The invention includes a polishing head adapted to retain a backing pad having a selected contour, wherein the polishing head is adapted to press the backing pad against an edge of a substrate. Numerous other aspects are provided.