The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8133318 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 13, 2012

Filed:

May. 26, 2009
Applicants:

Erich Daub, Emmerting, DE;

Hans Oelkrug, Tittmoning, DE;

Oliver Schmelmer, Burghausen, DE;

Inventors:

Erich Daub, Emmerting, DE;

Hans Oelkrug, Tittmoning, DE;

Oliver Schmelmer, Burghausen, DE;

Assignee:

Siltronic AG, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 15/00 (2006.01); C30B 21/06 (2006.01); C30B 27/02 (2006.01); C30B 23/00 (2006.01); C30B 25/00 (2006.01); C30B 28/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

An epitaxially coated silicon wafer comprises a plane surface misoriented relative to a {110} crystal plane, wherein the <110> direction of the single silicon crystal is tilted away by the angle θ from the normal to the wafer surface and the projection of the tilted <110> direction forms an angle φ with the direction <−110> in the wafer, and θ is given by 0≦θ≦3° and 45°≦φ≦90°, as well as for all symmetrically equivalent directions.


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