The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Apr. 10, 2009
Michael Totzeck, Schwaebisch Gmuend, DE;
Daniel Kraehmer, Essingen, DE;
Ralf Mueller, Aalen, DE;
Johannes Ruoff, Aalen, DE;
Vladan Blahnik, Aalen, DE;
Michael Totzeck, Schwaebisch Gmuend, DE;
Daniel Kraehmer, Essingen, DE;
Ralf Mueller, Aalen, DE;
Johannes Ruoff, Aalen, DE;
Vladan Blahnik, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The present disclosure relates to specification, optimization and matching of optical systems by use of orientation Zernike polynomials. In some embodiments, a method for assessing the suitability of an optical system of a microlithographic projection exposure apparatus is provided. The method can include determining a Jones pupil of the optical system, at least approximately describing the Jones pupil using an expansion into orientation Zernike polynomials, and assessing the suitability of the optical system on the basis of the expansion coefficient of at least one of the orientation Zernike polynomials in the expansion.