The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2012
Filed:
Jun. 03, 2009
Geoffrey Ryding, Manchester, MA (US);
Theodore Smick, Essex, MA (US);
Marvin Farley, Ipswich, MA (US);
Takao Sakase, Rowley, MA (US);
BO Vanderberg, Gloucester, MA (US);
Geoffrey Ryding, Manchester, MA (US);
Theodore Smick, Essex, MA (US);
Marvin Farley, Ipswich, MA (US);
Takao Sakase, Rowley, MA (US);
Bo Vanderberg, Gloucester, MA (US);
Axcelis Technologies Inc., Beverly, MA (US);
Abstract
A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.