The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2012
Filed:
Feb. 08, 2011
Takafumi Niwa, Koshi, JP;
Hiroshi Nakamura, Koshi, JP;
Hideharu Kyouda, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate treatment method including a first treatment process (Sto S) for exposing, heating, and developing a substrate on which a first resist is formed, thereby forming a first resist pattern, and a second treatment process (Sto S) for forming a second resist film on the substrate on which the first resist pattern is formed, exposing, heating, and developing the substrate on which the second resist film is formed, thereby forming a second resist pattern. Also, the substrate treatment method compensates a first treatment condition in a first treatment process (Sto S) based on a measured value of a line width of the second resist pattern and a second treatment condition in a second treatment process (Sto S) based on a measured value of a line width of the first resist pattern.