The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Jun. 28, 2007
Gaurav Verma, Sunnyvale, CA (US);
BO Su, San Jose, CA (US);
William Volk, San Francisco, CA (US);
Harold Lehon, Santa Cruz, CA (US);
Carl Hess, Los Altos, CA (US);
Gaurav Verma, Sunnyvale, CA (US);
Bo Su, San Jose, CA (US);
William Volk, San Francisco, CA (US);
Harold Lehon, Santa Cruz, CA (US);
Carl Hess, Los Altos, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs are provided. One method includes generating simulated images illustrating how each of the different reticle designs will be printed on a wafer at different values of one or more parameters of the wafer printing process. The method also includes detecting defects in each of the different reticle designs using the simulated images. In addition, the method includes determining a process window for the wafer printing process for each of the different reticle designs based on results of the detecting step.