The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 24, 2012
Filed:
Aug. 24, 2006
Shogo Matsumaru, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Shingenori Fujikawa, Saitama-ken, JP;
Toyoki Kunitake, Fukuoka-ken, JP;
Shogo MatsuMaru, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Shingenori Fujikawa, Saitama-ken, JP;
Toyoki Kunitake, Fukuoka-ken, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Riken, Wako-shi, JP;
Abstract
A film-forming material that is capable of forming, at a low temperature, a film having a high degree of etching resistance and a high etching selectivity ratio relative to an organic film, as well as a method of forming a pattern that uses the film-forming material. The film-forming material includes a metal compound (W) capable of generating a hydroxyl group upon hydrolysis, and a solvent (S) in which the metal compound is dissolved, wherein the solvent (S) includes a solvent (S1) with a boiling point of at least 155° C. that contains no functional groups that react with the metal compound (W). The method of forming a pattern includes the steps of: coating a pattern, which has been formed on top of an organic film of a laminate that includes a substrate and the organic film, using the above film-forming material, and then conducting etching of the organic film using the pattern as a mask.