The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 06, 2011
Filed:
May. 06, 2008
Verlyn Fischer, San Jose, CA (US);
Chris Maher, Campbell, CA (US);
Harish Hiriyannaiah, San Jose, CA (US);
Younus Vora, San Jose, CA (US);
Ping Ding, San Jose, CA (US);
Andrew Hill, San Jose, CA (US);
Verlyn Fischer, San Jose, CA (US);
Chris Maher, Campbell, CA (US);
Harish Hiriyannaiah, San Jose, CA (US);
Younus Vora, San Jose, CA (US);
Ping Ding, San Jose, CA (US);
Andrew Hill, San Jose, CA (US);
KLA-Tencor Corp., San Jose, CA (US);
Abstract
Computer-implemented methods, computer-readable media, and systems for identifying one or more optical modes of an inspection system as candidates for use in inspection of a layer of a wafer are provided. One method includes determining one or more characteristics of images of the layer of the wafer acquired using the inspection system and different optical modes available on the inspection system. The method also includes identifying a first portion of the different optical modes as not candidates for use in the inspection of the layer of the wafer based on the one or more characteristics of the images. In addition, the method includes generating output by eliminating the first portion of the different optical modes from the different optical modes at which the images were acquired such that the output includes a second portion of the different optical modes indicated as the candidates for use in the inspection.