The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
Mar. 13, 2007
Karl-heinz Schuster, Koenigsbronn, DE;
Juergen Hartmaier, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Dieter Schmerek, Huettlingen, DE;
Detlev Mueller, Ellwangen, DE;
Otto Hahnemann, Noerdlingen, DE;
Frank Marianek, Oberkochen, DE;
Gundula Weiss, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Juergen Hartmaier, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Dieter Schmerek, Huettlingen, DE;
Detlev Mueller, Ellwangen, DE;
Otto Hahnemann, Noerdlingen, DE;
Frank Marianek, Oberkochen, DE;
Gundula Weiss, Aalen, DE;
Damian Fiolka, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.