The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2011
Filed:
Feb. 28, 2008
Rodolfo P. Belen, San Francisco, CA (US);
Edward P. Hammond, Iv, Hillsborough, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, San Jose, CA (US);
Alexander M. Paterson, San Jose, CA (US);
Valentin N. Todorow, Palo Alto, CA (US);
Rodolfo P. Belen, San Francisco, CA (US);
Edward P. Hammond, IV, Hillsborough, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, San Jose, CA (US);
Alexander M. Paterson, San Jose, CA (US);
Valentin N. Todorow, Palo Alto, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present invention provide apparatus and method for processing a substrate with increased uniformity. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus comprises a chamber body defining a processing volume, a substrate support disposed in the processing volume, a showerhead disposed in the processing volume opposite to the substrate support, and a plasma generation assembly configured to ignite a plasma from the processing gases in the processing gas in the processing volume. The showerhead is configured to provide one or more processing gases to the processing volume. The showerhead has two or more distribution zones each independently controllable.