The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2011
Filed:
Mar. 18, 2005
Aurelian Dodoc, Heidenheim, DE;
Wilhelm Ulrich, Aalen, DE;
Dieter Bader, Goeggingen, DE;
Alexander Epple, Aalen, DE;
Aurelian Dodoc, Heidenheim, DE;
Wilhelm Ulrich, Aalen, DE;
Dieter Bader, Goeggingen, DE;
Alexander Epple, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|<0.05, and the planar image field having a minimum image field diameter suitable for microlithography of more than 1 mm.