The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Jul. 01, 2009
Chingwen Yeh, Cupertino, CA (US);
James B. Boyce, Los Altos, CA (US);
Kathleen Boyce, Legal Representative, Los Altos, CA (US);
Jingkuang Chen, Rochester, NY (US);
Feixia Pan, Cypress, CA (US);
Joel A. Kubby, Rochester, NY (US);
Chingwen Yeh, Cupertino, CA (US);
James B. Boyce, Los Altos, CA (US);
Kathleen Boyce, legal representative, Los Altos, CA (US);
Jingkuang Chen, Rochester, NY (US);
Feixia Pan, Cypress, CA (US);
Joel A. Kubby, Rochester, NY (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.