The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
May. 29, 2008
Kaushik Chanda, Fishkill, NY (US);
Ronald Filippi, Wappingers Falls, NY (US);
Stephan Grunow, Poughkeepsie, NY (US);
Chao-kun HU, Somers, NY (US);
Sujatha Sankaran, New Paltz, NY (US);
Andrew H. Simon, Fishkill, NY (US);
Theodorus E. Standaert, Pine Bush, NY (US);
Kaushik Chanda, Fishkill, NY (US);
Ronald Filippi, Wappingers Falls, NY (US);
Stephan Grunow, Poughkeepsie, NY (US);
Chao-Kun Hu, Somers, NY (US);
Sujatha Sankaran, New Paltz, NY (US);
Andrew H. Simon, Fishkill, NY (US);
Theodorus E. Standaert, Pine Bush, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An interconnect structure for an integrated circuit (IC) device includes an elongated, electrically conductive line comprising one or more segments formed at a first width, w, and one or more segments formed at one or more additional widths, w. . . w, with the first width being narrower than each of the one or more additional widths; wherein the relationship of the total length, L, of the one or more conductive segments formed at the first width to the total lengths, L. . . L, of the one or more conductive segments formed at the one or more additional widths is selected such that, for a given magnitude of current carried by the conductive line, a critical length with respect to an electromigration short-length effect benefit is maintained such that a total length of the conductive line, L=L+L+ . . . +L, meets a minimum desired design length regardless of the critical length.