The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Oct. 26, 2007
Yuichi Doki, Koshi, JP;
Tokutarou Hayashi, Koshi, JP;
Yuichi Doki, Koshi, JP;
Tokutarou Hayashi, Koshi, JP;
Tokyo Electron Limited, Tokyo-to, JP;
Abstract
In a substrate processing system for processing a substrate, such as a wafer W, held by a substrate holding device rotatable about a vertical axis, such as a spin chuck, a jig is placed on the substrate holding device, and centrifugal acceleration imparted to a predetermined measuring position on the jig and an eccentricity of the measuring position from the rotation center of the spin chuck are determined. The position of the rotation center is determined on the basis of centrifugal accelerations imparted to the measuring position when the jig is placed at three different positions and eccentricities of the measuring position from the rotation center when the jig is placed at the three different positions. Data on a substrate placing position, the center of the substrate placed at which coincides with the rotation center, is stored as data of a substrate placing position at which a substrate is to be placed.