The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2011
Filed:
Jan. 19, 2010
Applicants:
Toshihisa Nozawa, Amagasaki, JP;
Tamaki Yuasa, Amagasaki, JP;
Inventors:
Toshihisa Nozawa, Amagasaki, JP;
Tamaki Yuasa, Amagasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
When plasma processing is finished, a gate valveis closed and cleaning gas is ejected from holesof a shower plate, and at the same time, a microwave is generated from a microwave generator. Further, at this time, the inside of a process chamberis exhausted through a second exhaust port. Since the exhaust is conducted through a second exhaust portpositioned lower than a wafer stagein a lowered state when the inside of the process chamberis cleaned, it is possible to more effectively remove gas and reaction products deposited especially in a lower portion of the process chamber