The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Mar. 27, 2009
Applicants:
Jeong-hee Park, Hwaseong-si, KR;
Yong-ho Ha, Hwaseong-si, KR;
Hyeong-geun an, Hwaseong-si, KR;
Joon-sang Park, Seoul, KR;
Hyun-suk Kwon, Seoul, KR;
Myung-jin Kang, Suwon-si, KR;
Doo-hwan Park, Seoul, KR;
Inventors:
Jeong-Hee Park, Hwaseong-si, KR;
Yong-Ho Ha, Hwaseong-si, KR;
Hyeong-Geun An, Hwaseong-si, KR;
Joon-Sang Park, Seoul, KR;
Hyun-Suk Kwon, Seoul, KR;
Myung-Jin Kang, Suwon-si, KR;
Doo-Hwan Park, Seoul, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 47/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A contact structure that includes a first pattern formed on a substrate, wherein the first pattern has a recessed region in an upper surface thereof, a planarized buffer pattern formed on the first pattern, and a conductive pattern formed on the planarized buffer pattern.