The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Sep. 06, 2006
Antonio Casares, Aalen, DE;
Thomas Kemen, Aalen, DE;
Rainer Knippelmeyer, Aalen, DE;
Thomas Bayer, Herrenberg, DE;
Georg Fritz, Tuebingen, DE;
Johann Greschner, Pliezhausen, DE;
Samuel Kalt, Reutlingen, DE;
Antonio Casares, Aalen, DE;
Thomas Kemen, Aalen, DE;
Rainer Knippelmeyer, Aalen, DE;
Thomas Bayer, Herrenberg, DE;
Georg Fritz, Tuebingen, DE;
Johann Greschner, Pliezhausen, DE;
Samuel Kalt, Reutlingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Applied Materials Israel Ltd, Rehovot, IL;
Abstract
The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.