The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
Jan. 19, 2006
Mitsuro Sugita, Ohta-ku, JP;
Kazuaki Ohmi, Yokohama, JP;
Takao Yonehara, Kawasaki, JP;
Toshihiko Tsuji, Utsunomiya, JP;
Takaaki Terashi, Utsunomiya, JP;
Tohru Kohda, Utsunomiya, JP;
Shinji Tsutsui, Utsunomiya, JP;
Mitsuro Sugita, Ohta-ku, JP;
Kazuaki Ohmi, Yokohama, JP;
Takao Yonehara, Kawasaki, JP;
Toshihiko Tsuji, Utsunomiya, JP;
Takaaki Terashi, Utsunomiya, JP;
Tohru Kohda, Utsunomiya, JP;
Shinji Tsutsui, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.