The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2011

Filed:

Mar. 26, 2008
Applicants:

Kan-jung Chia, Hsin-Chu, TW;

Shang-wei Chen, Hsin-Chu, TW;

Inventors:

Kan-Jung Chia, Hsin-Chu, TW;

Shang-Wei Chen, Hsin-Chu, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/73 (2006.01);
U.S. Cl.
CPC ...
Abstract

A packaging substrate structure with a semiconductor chip embedded therein is disclosed, including a carrier board having a first and an opposed second surfaces and disposed with at least a through cavity; a semiconductor chip received in the through cavity, the chip having an active surface and an inactive surface opposite to one another, wherein the active surface has a plurality of electrode pads, a passivation layer is disposed on the active surface with the electrode pads exposed from the passivation layer, and metal pads are disposed on surfaces of the electrode pads; a buffer layer disposed on the first surface of the carrier board and on surfaces of the passivation layer and the metal pads; a first dielectric layer disposed on the buffer layer; and a first circuit layer disposed on the first dielectric layer and electrically connected with the metal pads of the chip via first conductive structures disposed in the buffer layer and the first dielectric layer, wherein the CTE (Coefficient of Thermal Expansion) of the buffer layer is between the CTE of the semiconductor chip and the CTE of the dielectric layer. Thereby, the buffer layer can reduce the stress on the interface between the dielectric layer and the semiconductor chip.


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