The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
Feb. 20, 2007
Hengpeng Wu, Hillsborough, NJ (US);
Wookyu Kim, Bridgewater, NJ (US);
Hong Zhuang, Raritan, NJ (US);
Pinghung LU, Bridgewater, NJ (US);
Mark Neisser, Whitehouse Station, NJ (US);
David Abdallah, Bernardsville, NJ (US);
Ruzhi Zhang, Pennington, NJ (US);
Hengpeng Wu, Hillsborough, NJ (US);
WooKyu Kim, Bridgewater, NJ (US);
Hong Zhuang, Raritan, NJ (US);
PingHung Lu, Bridgewater, NJ (US);
Mark Neisser, Whitehouse Station, NJ (US);
David Abdallah, Bernardsville, NJ (US);
Ruzhi Zhang, Pennington, NJ (US);
AZ Electronic Materials USA Corp., Somerville, NJ (US);
Abstract
The present invention relates to a composition comprising: where Ris a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.