The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 20, 2011
Filed:
Oct. 27, 2006
Erh-kun Lai, Taichung County, TW;
Yen-hao Shih, Taipei County, TW;
Tzu-hsuan Hsu, Chiayi County, TW;
Shih-chih Lee, Yunlin County, TW;
Jung-yu Hsieh, Hsinchu, TW;
Kuang-yeu Hsieh, Hsin Chu, TW;
Erh-Kun Lai, Taichung County, TW;
Yen-Hao Shih, Taipei County, TW;
Tzu-Hsuan Hsu, Chiayi County, TW;
Shih-Chih Lee, Yunlin County, TW;
Jung-Yu Hsieh, Hsinchu, TW;
Kuang-Yeu Hsieh, Hsin Chu, TW;
Macronix International Co., Ltd., Hsinchu, TW;
Abstract
Memory cells including a semiconductor layer having at least two source/drain regions disposed below a surface of the semiconductor layer and separated by a channel region; a lower insulating layer disposed above the channel region; a charge storage layer disposed above the lower insulating layer; an upper insulating multi-layer structure disposed above the charge storage layer, wherein the upper insulating multi-layer structure comprises a polysilicon material layer interposed between a first dielectric layer and a second dielectric layer; and a gate disposed above the upper insulating multi-layer structure are described along with arrays thereof and methods of operation.