The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 06, 2011

Filed:

Jan. 23, 2009
Applicants:

Satoshi Sano, Nirasaki, JP;

Daiki Kurihara, Kyoto, JP;

Inventors:

Satoshi Sano, Nirasaki, JP;

Daiki Kurihara, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/308 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is an inspection method capable of performing an inspection of high reliability even for very fine and thin-film electrode pads of a target object, by using needle traces formed on the electrode pads and making the electrode pads repeatedly contact the probes at high accuracy. In the inspection method, under the control of a control unitof an inspection apparatus, by using old needle traces formed on the respective pads P of the target object such as a semiconductor wafer W, contactable regions S for the probesA in preparation for a present inspection, so that each of the probesA contact each of the electrode pad P in the contactable region S and within an empty area with no needle trace.


Find Patent Forward Citations

Sano, Satoshi. (2011). Inspection method and program for inspecting electrical characteristics of a semiconductor wafer (U.S. Patent No. 8013621). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8013621

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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