The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 30, 2011

Filed:

Dec. 23, 2008
Applicants:

David S. Collins, Williston, VT (US);

Robert M. Rassel, Colchester, VT (US);

Eric Thompson, Burlington, VT (US);

Inventors:

David S. Collins, Williston, VT (US);

Robert M. Rassel, Colchester, VT (US);

Eric Thompson, Burlington, VT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/93 (2006.01);
U.S. Cl.
CPC ...
Abstract

A deep trench varactor structure compatible with a deep trench capacitor structure and methods of manufacturing the same are provided. A buried plate layer is formed on a second deep trench, while the first trench is protected from formation of any buried plate layer. The inside of the deep trenches is filled with a conductive material to form inner electrodes. At least one doped well is formed outside and abutting portions of the first deep trench and constitutes at least one outer varactor electrode. Multiple doped wells may be connected in parallel to provide a varactor having complex voltage dependency of capacitance. The buried plate layer and another doped well connected thereto constitute an outer electrode of a linear capacitor formed on the second deep trench.


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