The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 23, 2011
Filed:
Aug. 17, 2006
Damian Fiolka, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Vladimir Davydenko, Oberkochen, DE;
Axel Scholz, Aalen, DE;
Markus Deguenther, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Damian Fiolka, Oberkochen, DE;
Manfred Maul, Aalen, DE;
Vladimir Davydenko, Oberkochen, DE;
Axel Scholz, Aalen, DE;
Markus Deguenther, Aalen, DE;
Johannes Wangler, Koenigsbronn, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.