The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 23, 2011

Filed:

Oct. 26, 2009
Applicants:

Shinji Nagai, Hiratsuka, JP;

Takanobu Ishihara, Hiratsuka, JP;

Kouji Kakizaki, Hiratsuka, JP;

Hiroshi Sobukawa, Tokyo, JP;

Takeshi Murakami, Tokyo, JP;

Masahiro Inoue, Tokyo, JP;

Inventors:

Shinji Nagai, Hiratsuka, JP;

Takanobu Ishihara, Hiratsuka, JP;

Kouji Kakizaki, Hiratsuka, JP;

Hiroshi Sobukawa, Tokyo, JP;

Takeshi Murakami, Tokyo, JP;

Masahiro Inoue, Tokyo, JP;

Assignees:

Gigaphton Inc., Tochigi, JP;

Ebara Corporation, Tokyo, JP;

Kabushiki Kaisha Topcon, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.


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