The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Jun. 14, 2007
Eric Perozziello, Half Moon Bay, CA (US);
Thomas Joseph Kropewnicki, San Mateo, CA (US);
Gregory L. Wojcik, Ben Lomond, CA (US);
Andreas Goebel, Mountain View, CA (US);
Claes Bjorkman, Los Altos, CA (US);
Eric Perozziello, Half Moon Bay, CA (US);
Thomas Joseph Kropewnicki, San Mateo, CA (US);
Gregory L. Wojcik, Ben Lomond, CA (US);
Andreas Goebel, Mountain View, CA (US);
Claes Bjorkman, Los Altos, CA (US);
Applied Matrials, Inc., Santa Clara, CA (US);
Abstract
Methods of forming a 3D structure in a substrate are disclosed. A layer of resist is deposited on the substrate. The layer of resist is patterned to define an edge at a predetermined location. The resist is reflowed to form a tapered region extending from the etch. Both the reflowed resist and the substrate are concurrently etched to transfer the tapered profile of the reflowed resist into the underlying substrate to form an angled surface. The etching is discontinued before all of the resist is consumed by the etching.