The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Jan. 23, 2006
Hiroyuki Shinada, Mitaka, JP;
Hisaya Murakoshi, Tokyo, JP;
Hideo Todokoro, Hinode, JP;
Hiroshi Makino, Kokubunji, JP;
Yoshihiro Anan, Kokubunji, JP;
Hiroyuki Shinada, Mitaka, JP;
Hisaya Murakoshi, Tokyo, JP;
Hideo Todokoro, Hinode, JP;
Hiroshi Makino, Kokubunji, JP;
Yoshihiro Anan, Kokubunji, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
An electric field for decelerating an electron beam is formed on a surface of a sample semiconductor to be inspected, an electron beam having a specific area (a sheet electron beam) and containing a component having such an energy as not to reach the surface of the sample semiconductor is reflected in the very vicinity of the surface of the sample semiconductor by action of the electric field for deceleration and then forms an image through an imaging lens. Thus images of plural fields on the surface of the sample semiconductor are obtained and are stored in image memory units. By comparing the stored images of the plural fields with one another, the presence and position of a defect in the fields are determined.