The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2011
Filed:
Aug. 14, 2008
Wagdi W. Abadeer, Jericho, VT (US);
Kiran V. Chatty, Williston, VT (US);
Robert J. Gauthier, Jr., Hinesburg, VT (US);
Jed H. Rankin, Richmond, VT (US);
Robert Robison, Colchester, VT (US);
Yun Shi, South Burlington, VT (US);
William R. Tonti, Essex Junction, VT (US);
Wagdi W. Abadeer, Jericho, VT (US);
Kiran V. Chatty, Williston, VT (US);
Robert J. Gauthier, Jr., Hinesburg, VT (US);
Jed H. Rankin, Richmond, VT (US);
Robert Robison, Colchester, VT (US);
Yun Shi, South Burlington, VT (US);
William R. Tonti, Essex Junction, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
In one embodiment, a second metal line embedded in a second dielectric layer overlies a first metal line embedded in a first dielectric layer. A portion of the second dielectric layer overlying the first metal line is recessed employing a photoresist and the second metal line as an etch mask. A doped semiconductor spacer is formed within the recess to provide a resistive link between the first metal line and the second metal line. In another embodiment, a first metal line and a second metal line are embedded in a dielectric layer. An area of the dielectric layer laterally abutting the first and second metal lines is recessed employing a photoresist and the first and second metal lines as an etch mask. A doped semiconductor spacer is formed on sidewalls of the first and second metal lines, providing a resistive link between the first and second metal lines.