The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2011
Filed:
Mar. 31, 2008
Merritt Funk, Austin, TX (US);
Radha Sundararajan, Dripping Springs, TX (US);
Hyung Joo Lee, Austin, TX (US);
Daniel Prager, Hopewell Junction, NY (US);
Asao Yamashita, Fishkill, NY (US);
Merritt Funk, Austin, TX (US);
Radha Sundararajan, Dripping Springs, TX (US);
Hyung Joo Lee, Austin, TX (US);
Daniel Prager, Hopewell Junction, NY (US);
Asao Yamashita, Fishkill, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
The invention provides a method of processing a substrate using multilayer processing sequences and Multi-Layer/Multi-Input/Multi-Output (MLMIMO) models and libraries that can include one or more masking layer creation procedures, one or more pre-processing measurement procedures, one or more Partial-Etch (P-E) procedures, one or more Final-Etch (F-E) procedures, and one or more post-processing measurement procedures.