The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2011
Filed:
Feb. 19, 2008
Raymond John Donohoe, Dresden, DE;
Krishna Vepa, Danville, CA (US);
Paul V. Miller, Cupertino, CA (US);
Ronald Rayandayan, Union City, CA (US);
Hong Wang, Cupertino, CA (US);
Raymond John Donohoe, Dresden, DE;
Krishna Vepa, Danville, CA (US);
Paul V. Miller, Cupertino, CA (US);
Ronald Rayandayan, Union City, CA (US);
Hong Wang, Cupertino, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A silicon-on-insulator transfer wafer having a front surface with a circumferential lip around a circular recess is polished. In one version, the circular recess on the front surface of the wafer is masked by filling the recess with spin-on-glass. The front surface of the wafer is exposed to an etchant to preferentially etch away the circumferential lip, while the circular recess is masked by the spin-on-glass. The spin-on glass is removed, and the front surface of the transfer wafer is polished. Other methods of removing the circumferential lip include applying a higher pressure to the circumferential lip in a polishing process, and directing a pressurized fluid jet at the base of the circumferential lip.