The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2011
Filed:
Mar. 31, 2009
Shigeru Wakiyama, Chiba, JP;
Kenichi Akamatsu, Chiba, JP;
Shigeru Wakiyama, Chiba, JP;
Kenichi Akamatsu, Chiba, JP;
SII NanoTechnology Inc., Chiba, JP;
Abstract
Provided are a structure of an apparatus for analysis, inspection, and measurement in which a support structure supporting a detection unit is resistant to disturbance, suppresses a reduction in resolution during large-sample measurement, and has high rigidity, and a probe microscope using the apparatus structure. The apparatus structure supporting the detection unit which is opposed to a sample which is located on a unit movable in at least one axis direction and is an object to be analyzed has an arch shape. In the apparatus structure having the arch shape and supporting the detection unit, a surface substantially perpendicular to a flat surface portion of a sample holder located immediately under the apparatus structure is formed. The detection unit is supported on the perpendicular surface. The arch-shaped apparatus structure is a curved structure consistent with a catenary curve.