The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2011
Filed:
Mar. 16, 2007
Applicants:
Jhun-hua Chen, Chang Hua, TW;
Hua-tai Lin, Hsin-Chu, TW;
Lai Chien Wen, Hsin-Chu, TW;
Fu-jye Liang, Kaohsiung, TW;
Inventors:
Jhun-Hua Chen, Chang Hua, TW;
Hua-Tai Lin, Hsin-Chu, TW;
Lai Chien Wen, Hsin-Chu, TW;
Fu-Jye Liang, Kaohsiung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); H01L 21/00 (2006.01); G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A photolithography system for printing a pattern of at least one contact or via on a wafer is provided. The system comprises a reticle having a layout, the layout comprises at least one polygon-shaped hole, wherein the at least one polygon-shaped hole comprises at least eight sides.