The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7934177 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 26, 2011

Filed:

Feb. 06, 2007
Applicants:

Jaw-jung Shin, Hsin-Chu, TW;

King-chang Shu, Banciao, TW;

Tsai-sheng Gau, Hsin-Chu, TW;

Burn Jeng Lin, Hsin-Chu, TW;

Inventors:

Jaw-Jung Shin, Hsin-Chu, TW;

King-Chang Shu, Banciao, TW;

Tsai-Sheng Gau, Hsin-Chu, TW;

Burn Jeng Lin, Hsin-Chu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for splitting a pattern layout including providing the pattern layout having features, checking the pattern layout to determine the features that require splitting, coloring the features that require splitting with a first and second color, resolving coloring conflicts by decomposing the feature with the coloring conflict and coloring the decomposed feature with the first and second color, and generating a first mask with features of the first color and a second mask with features of the second color.


Find Patent Forward Citations

Shin, Jaw-Jung. (2011). Method and system for a pattern layout split (U.S. Patent No. 7934177). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7934177

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