The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Jun. 16, 2006
Shogo Matsumaru, Kawasaki, JP;
Toshiyuki Ogata, Kawasaki, JP;
Kiyoshi Ishikawa, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Shigenori Fujikawa, Fujimi, JP;
Toyoki Kunitake, Kasuya-gun, JP;
Shogo Matsumaru, Kawasaki, JP;
Toshiyuki Ogata, Kawasaki, JP;
Kiyoshi Ishikawa, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Shigenori Fujikawa, Fujimi, JP;
Toyoki Kunitake, Kasuya-gun, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
There are provided a coating material which improves an etching resistance of a pattern in an etching process using a pattern formed on a substrate as a mask. The material is a pattern coating material for an etching process using a pattern formed on a substrate as a mask, including a metal compound (W) which can produce a hydroxyl group on hydrolysis.