The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2011
Filed:
Oct. 22, 2004
Manabu Amikura, Nirasaki, JP;
Teruo Iwata, Nirasaki, JP;
Manabu Amikura, Nirasaki, JP;
Teruo Iwata, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
The present invention relates to a showerhead that supplies a source gas and a supporting gas for depositing a film into a processing vessel of a film deposition apparatus. The showerhead includes a body which is provided with a gas jetting surface (). In the showerhead body, there are defined a first diffusion chamber () that receives the source gas and diffuses the same, and a second diffusion chamber () that receives the supporting gas and diffuses the same. The gas jetting surface has source-gas jetting orifices (A) that are in communication with the first diffusion chamber, and first supporting-gas jetting orifices (B) that are in communication with the second diffusion chamber. Each of the first supporting-gas jetting orifices (B) are formed into a ring shape that adjacently surrounds a corresponding one of the source-gas jetting orifices (A).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile