The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2011
Filed:
Nov. 14, 2007
Thomas J. Aton, Dallas, TX (US);
Carl A. Vickery, Garland, TX (US);
Frank Scott Johnson, Richardson, TX (US);
James Walter Blatchford, Richardson, TX (US);
Benjamen Michael Rathsack, Austin, TX (US);
Benjamin Mckee, Richardson, TX (US);
Thomas J. Aton, Dallas, TX (US);
Carl A. Vickery, Garland, TX (US);
Frank Scott Johnson, Richardson, TX (US);
James Walter Blatchford, Richardson, TX (US);
Benjamen Michael Rathsack, Austin, TX (US);
Benjamin McKee, Richardson, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database. The drawn pattern data describes first device features and second device features, the second device features being associated with design specifications for providing a desired connectivity of the first device features to the second device features. At least a first plurality of the first device features have drawn patterns that will not result in sufficient coverage to effect the desired connectivity. Photomask patterns are formed for the first device features, wherein the photomask patterns for the first plurality of the first device features will result in the desired coverage. Integrated circuit devices formed using the principles of the present disclosure are also taught.